Tim Fühner

Lehrstuhl für Informatik 3 (Rechnerarchitektur)

Topography-aware BARC optimization for double patterning (2010) Jahn J, Erdmann A, Fühner T, Liu S, Shao F, Barenbaum A Conference contribution, Original article Mask diffraction analysis and optimization for EUV masks (2010) Erdmann A, Fühner T, Evanschitzky P Conference contribution, Conference Contribution Efficient Analysis of Three Dimensional EUV Mask Induced Imageing Artifacts Using the Waveguide Decomposition Method (2009) Shao F, Evanschitzky P, Fühner T, Erdmann A Conference contribution Rigorous diffraction simulations of topographic wafer stacks in double patterning (2009) Shao F, Evanschitzky P, Fühner T, Erdmann A Journal article Application of a memetic algorithm to the calibration of micro-lithography (2007) Christoph D, Fühner T, Tollkühn B, Erdmann A, Kókai G Book chapter / Article in edited volumes Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems (2004) Fühner T, Erdmann A, Farkas R, Tollkühn B, Kókai G Conference contribution, Original article Incorporating Linkage Learning into the GeLog Framework (2003) Fühner T, Kókai G Journal article, Original article Will Darwins's Law Help Us to Improve Our Resist Models? (2003) Tollkühn B, Fühner T, Matiut D, Erdmann A, Semmler A, Küchler B, Kókai G Conference contribution, Original article Optimization of one-and two dimensional masks in the optical lithography (2003) Farkas R, Kókai G, Erdmann A, Fühner T, Tollkühn B Conference contribution, Original article Mask and Source Optimization for Lithographic Imaging Systems (2003) Erdmann A, Farkas R, Fühner T, Tollkühn B, Kókai G Conference contribution, Original article