Mask and Source Optimization for Lithographic Imaging Systems
Erdmann A, Farkas R, Fühner T, Tollkühn B, Kókai G (2003)
Publication Language: English
Publication Type: Conference contribution, Original article
Publication year: 2003
Book Volume: 5182
Pages Range: 88-102
Conference Proceedings Title: Wave-Optical Systems Engineering II, SPIE 5182
Event location: San Diego, CA
ISBN: 978081945055
URI: http://www2.informatik.uni-erlangen.de/publication/download/spie5182_12.ps.gz
DOI: 10.1117/12.504732
Authors with CRIS profile
How to cite
APA:
Erdmann, A., Farkas, R., Fühner, T., Tollkühn, B., & Kókai, G. (2003). Mask and Source Optimization for Lithographic Imaging Systems. In Wyrowski, F. (Eds.), Wave-Optical Systems Engineering II, SPIE 5182 (pp. 88-102). San Diego, CA, US.
MLA:
Erdmann, Andreas, et al. "Mask and Source Optimization for Lithographic Imaging Systems." Proceedings of the Wave-Optical Systems Engineering II, San Diego, CA Ed. Wyrowski, F., 2003. 88-102.
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