Dose-dependent milling efficiencies of helium and nitrogen beams in PMMA
Ellrott G, Ogawa S, Uno M, Morita Y, Manoharan M, Kolesnik-Gray M, Krstic V, Mizuta H (2021)
Publication Type: Journal article, Letter
Publication year: 2021
Journal
Book Volume: 249
Article Number: 111621
DOI: 10.1016/j.mee.2021.111621
Abstract
Focused ion beams with varied exposure dose were used to mill rectangular trenches into PMMA on SiO2. The dose response was investigated by atomic force microscopy measurements. TRIM calculations were used to simulate the ion distributions and damages expected inside the target. The depth of the trenches measured by AFM showed an unexpected decrease for intermediate dosages of high energetic helium ions in contrast to low energetic helium and nitrogen ions. This has been attributed to the formation of metastable blisters in the PMMA layer.
Authors with CRIS profile
Günter Ellrott
Sonderforschungsbereich/Transregio 306/1 Quantenkooperativität von Licht und Materie - QuCoLiMa
Maria Kolesnik-Gray
Chair of Applied Physics (LAP)
Vojislav Krstic
Professur für Angewandte Physik
Additional Organisation(s)
Related research project(s)
Involved external institutions
Japan Advanced Institute of Science and Technology (JAIST) / 北陸先端科学技術大学院大学
Japan (JP)
National Institute of Advanced Industrial Science and Technology / 産業技術総合研究所 (AIST)
Japan (JP)
Japan (JP)
National Institute of Advanced Industrial Science and Technology / 産業技術総合研究所 (AIST)
Japan (JP)
How to cite
APA:
Ellrott, G., Ogawa, S., Uno, M., Morita, Y., Manoharan, M., Kolesnik-Gray, M.,... Mizuta, H. (2021). Dose-dependent milling efficiencies of helium and nitrogen beams in PMMA. Microelectronic Engineering, 249. https://doi.org/10.1016/j.mee.2021.111621
MLA:
Ellrott, Günter, et al. "Dose-dependent milling efficiencies of helium and nitrogen beams in PMMA." Microelectronic Engineering 249 (2021).
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