Chen YC, Salter PS, Niethammer M, Widmann M, Kaiser F, Nagy R, Morioka N, Babin C, Erlekampf J, Berwian P, Booth MJ, Wrachtrup J (2019)
Publication Type: Journal article
Publication year: 2019
Book Volume: 19
Pages Range: 2377-2383
Journal Issue: 4
DOI: 10.1021/acs.nanolett.8b05070
Single photon emitters in silicon carbide (SiC) are attracting attention as quantum photonic systems (Awschalom et al. Nat. Photonics 2018, 12, 516-527; Atatüre et al. Nat. Rev. Mater. 2018, 3, 38-51). However, to achieve scalable devices, it is essential to generate single photon emitters at desired locations on demand. Here we report the controlled creation of single silicon vacancy (V Si ) centers in 4H-SiC using laser writing without any postannealing process. Due to the aberration correction in the writing apparatus and the nonannealing process, we generate single V Si centers with yields up to 30%, located within about 80 nm of the desired position in the transverse plane. We also investigated the photophysics of the laser writing V Si centers and concluded that there are about 16 photons involved in the laser writing V Si center process. Our results represent a powerful tool in the fabrication of single V Si centers in SiC for quantum technologies and provide further insights into laser writing defects in dielectric materials.
APA:
Chen, Y.-C., Salter, P.S., Niethammer, M., Widmann, M., Kaiser, F., Nagy, R.,... Wrachtrup, J. (2019). Laser Writing of Scalable Single Color Centers in Silicon Carbide. Nano Letters, 19(4), 2377-2383. https://doi.org/10.1021/acs.nanolett.8b05070
MLA:
Chen, Yu-Chen, et al. "Laser Writing of Scalable Single Color Centers in Silicon Carbide." Nano Letters 19.4 (2019): 2377-2383.
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