Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing

Jambreck JD, Schmitt H, Amon B, Rommel M, Bauer AJ, Frey L (2010)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2010

Journal

Microelectronic Engineering Elsevier

Book Volume: 87

Pages Range: 1123-1126

DOI: 10.1016/j.mee.2009.11.040

Abstract

UV nanoimprint lithography (UV-NIL) is applied for the fabrication of metallic scanning probe microscopy (SPM) tips. The NIL templates are generated by focused ion beam (FIB) processing. The tips are imprinted by UV-NIL using a resist which is a mixture of Ag particles and an UV-curing polymer. After imprinting, tips are further shaped by FIB to achieve a high aspect ratio and a small radius at the apex. The resulting tips are analyzed and methods for increasing the metal-to-polymer ratio are presented and discussed.

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials (EAM)

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE)

How to cite

APA:

Jambreck, J.D., Schmitt, H., Amon, B., Rommel, M., Bauer, A.J., & Frey, L. (2010). Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing. Microelectronic Engineering, 87, 1123-1126. https://doi.org/10.1016/j.mee.2009.11.040

MLA:

Jambreck, J. D., et al. "Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing." Microelectronic Engineering 87 (2010): 1123-1126.

BibTeX: Download