Eidgenössische Materialprüfungs- und Forschungsanstalt (Empa) / Swiss Federal Laboratories for Materials Science & Technology
Research facility
Location:
Dübendorf,
Switzerland (CH)
ISNI: 0000000123313059
ROR: https://ror.org/02x681a42
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Erratum to "advanced thin film technology for ultrahigh resolution X-ray microscopy" [Ultramicroscopy 109 (2009) 1360-1364] (DOI:10.1016/j.ultramic.2009.07.005) (2010)
Vila-Comamala J, Jefimovs K, Raabe J, Pilvi T, Fink R, Senoner M, Maassdorf A, et al.
Journal article, Erratum
NanoXAS - The in situ combination of scanning transmission X-ray and scanning probe microscopy (2010)
Wenzel S, Fink R, Raabe J, Quitmann C, Hug HJ
Conference contribution, Conference Contribution
NanoXAS, a novel concept for high resolution microscopy (2009)
Fink R, Raabe J, Quitmann C, Hug HJ
Conference contribution, Conference Contribution
A practical, self-catalytic, atomic layer deposition of silicon dioxide (2008)
Bachmann J, Zierold R, Chong YT, Hauert R, Sturm C, Schmidt-Grund R, Rheinlaender B, et al.
Journal article, Original article