Solid-phase epitaxy of silicon amorphized by implantation of the alkali elements rubidium and cesium

Maier R, Haeublein V, Ryssel H, Völlm H, Feili D, Seidel H, Frey L (2012)

Publication Status: Published

Publication Type: Conference contribution, Conference Contribution

Publication year: 2012

Book Volume: 1496

Pages Range: 276-279

Event location: Valladolid

ISBN: 9780735411098

DOI: 10.1063/1.4766542

Authors with CRIS profile

Heiner Ryssel Technische Fakultät Lothar Frey Lehrstuhl für Elektronische Bauelemente

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE)

How to cite

APA:

Maier, R., Haeublein, V., Ryssel, H., Völlm, H., Feili, D., Seidel, H., & Frey, L. (2012). Solid-phase epitaxy of silicon amorphized by implantation of the alkali elements rubidium and cesium. In Proceedings of the 19th International Conference on Ion Implantation Technology 2012, IIT 2012 (pp. 276-279). Valladolid.

MLA:

Maier, Reinhard, et al. "Solid-phase epitaxy of silicon amorphized by implantation of the alkali elements rubidium and cesium." Proceedings of the 19th International Conference on Ion Implantation Technology 2012, IIT 2012, Valladolid 2012. 276-279.

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