In Situ Monitoring of the Ambient Gas Phase during PVT Growth of Nominally Undoped High Resistivity SiC Boules

Ihle J, Wellmann P (2023)


Publication Type: Book chapter / Article in edited volumes

Publication year: 2023

Journal

Publisher: Trans Tech Publications Ltd

Series: Solid State Phenomena

Book Volume: 344

Pages Range: 23-28

DOI: 10.4028/p-568g51

Abstract

The aim of this study is to show the applicability of continuous residual gas analysis for growth monitoring of undoped SiC with physical vapor transport (PVT). For this purpose, two crystals were grown, one without doping and one with continuous nitrogen doping. During the processes continuous residual gas analysis were conducted and evaluated with emphasis on the temporal variations of the nitrogen content. The charge carrier concentration of the final crystals wasdetermined by optical methods (spectrally resolved absorption measurement with UV-VIS and Raman spectroscopy) and the results were compared with the residual gas analysis during growth. A correlation was found between the measured nitrogen-related signal and the charge carrier concentration in the samples.

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How to cite

APA:

Ihle, J., & Wellmann, P. (2023). In Situ Monitoring of the Ambient Gas Phase during PVT Growth of Nominally Undoped High Resistivity SiC Boules. In (pp. 23-28). Trans Tech Publications Ltd.

MLA:

Ihle, Jonas, and Peter Wellmann. "In Situ Monitoring of the Ambient Gas Phase during PVT Growth of Nominally Undoped High Resistivity SiC Boules." Trans Tech Publications Ltd, 2023. 23-28.

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