Towards SiC-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters

Schraml M, Papathanasiou N, May A, Weiss T, Erlbacher T (2023)


Publication Type: Book chapter / Article in edited volumes

Publication year: 2023

Journal

Publisher: Trans Tech Publications Ltd

Series: Key Engineering Materials

Book Volume: 947

Pages Range: 77-82

DOI: 10.4028/p-959z1t

Abstract

4H silicon carbide (SiC) based pin photodiodes with a sensitivity in the vacuum ultraviolet spectrum (VUV) demand newly developed emitter doping profiles. This work features the first ever reported 4H-SiC pin photodiodes with an implanted p-emitter and a noticeable sensitivity at a wavelength of 200 nm. As a first step, Aluminum doping profiles produced by low energy ion implantation in 4H-SiC were characterized by secondary-ion mass spectrometry (SIMS). Photodiodes using these shallow emitters are compared to one with a deep p-emitter doping profile employing I-V characteristics and the spectral response. SIMS results demonstrate the possibility of shallow Al-implantation profiles using low implantation energies with all emitter profiles featuring characteristic I-V results. For some shallow doping profiles, a meassurable signal at the upper limit of the VUV spectrum could be demonstrated, paving the way towards 4H-SiC pin photodiodes with sensitivities for wavelengths below 200 nm.

Authors with CRIS profile

Involved external institutions

How to cite

APA:

Schraml, M., Papathanasiou, N., May, A., Weiss, T., & Erlbacher, T. (2023). Towards SiC-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters. In (pp. 77-82). Trans Tech Publications Ltd.

MLA:

Schraml, Michael, et al. "Towards SiC-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters." Trans Tech Publications Ltd, 2023. 77-82.

BibTeX: Download