Schraml M, Papathanasiou N, May A, Weiss T, Erlbacher T (2023)
Publication Type: Book chapter / Article in edited volumes
Publication year: 2023
Publisher: Trans Tech Publications Ltd
Series: Key Engineering Materials
Book Volume: 947
Pages Range: 77-82
DOI: 10.4028/p-959z1t
4H silicon carbide (SiC) based pin photodiodes with a sensitivity in the vacuum ultraviolet spectrum (VUV) demand newly developed emitter doping profiles. This work features the first ever reported 4H-SiC pin photodiodes with an implanted p-emitter and a noticeable sensitivity at a wavelength of 200 nm. As a first step, Aluminum doping profiles produced by low energy ion implantation in 4H-SiC were characterized by secondary-ion mass spectrometry (SIMS). Photodiodes using these shallow emitters are compared to one with a deep p-emitter doping profile employing I-V characteristics and the spectral response. SIMS results demonstrate the possibility of shallow Al-implantation profiles using low implantation energies with all emitter profiles featuring characteristic I-V results. For some shallow doping profiles, a meassurable signal at the upper limit of the VUV spectrum could be demonstrated, paving the way towards 4H-SiC pin photodiodes with sensitivities for wavelengths below 200 nm.
APA:
Schraml, M., Papathanasiou, N., May, A., Weiss, T., & Erlbacher, T. (2023). Towards SiC-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters. In (pp. 77-82). Trans Tech Publications Ltd.
MLA:
Schraml, Michael, et al. "Towards SiC-Based VUV Pin-Photodiodes - Investigations on 4H-SiC Photodiodes with Shallow Implanted Al Emitters." Trans Tech Publications Ltd, 2023. 77-82.
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