Magnetic direct-write skyrmion nanolithography

Ognev AV, Kolesnikov AG, Kim YJ, Cha IH, Sadovnikov AV, Nikitov SA, Soldatov I, Talapatra A, Mohanty J, Mruczkiewicz M, Ge Y, Kerber N, Dittrich F, Virnau P, Klaeui M, Kim YK, Samardak AS (2020)

Publication Type: Journal article

Publication year: 2020

Journal

ACS nano American Chemical Society

Book Volume: 14

Pages Range: 14960-14970

Journal Issue: 11

DOI: 10.1021/acsnano.0c04748

Abstract

Magnetic skyrmions are stable spin textures with quasi-particle behavior and attract significant interest in fundamental and applied physics. The metastability of magnetic skyrmions at zero magnetic field is particularly important to enable, for instance, a skyrmion racetrack memory. Here, the results of the nucleation of stable skyrmions and formation of ordered skyrmion lattices by magnetic force microscopy in (Pt/CoFeSiB/W)n multilayers, exploiting the additive effect of the interfacial Dzyaloshinskii-Moriya interaction, are presented. The appropriate conditions under which skyrmion lattices are confined with a dense two-dimensional liquid phase are identified. A crucial parameter to control the skyrmion lattice characteristics and the number of scans resulting in the complete formation of a skyrmion lattice is the distance between two adjacent scanning lines of a magnetic force microscopy probe. The creation of skyrmion patterns with complex geometry is demonstrated, and the physical mechanism of direct magnetic writing of skyrmions is comprehended by micromagnetic simulations. This study shows a potential of a direct-write (maskless) skyrmion (topological) nanolithography with sub-100 nm resolution, where each skyrmion acts as a pixel in the final topological image.

Involved external institutions

Korea University

Korea, Republic of (KR) Saratov Chernyshevsky State University / Saratovskiy Natsional'nyy Issledovatel'skiy Gosudarstvennyy Universitet Imeni N.g. Chernyshevskogo

Russian Federation (RU) Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden e.V. (IFW) / Leibniz Institute for Solid State and Materials Research Dresden

Germany (DE) Indian Institute of Technology Bombay

India (IN) Far Eastern Federal University

Russian Federation (RU) Johannes Gutenberg-Universität Mainz (JGU)

Germany (DE) Slovak Academy of Sciences (SAS) / Slovenská akadémia vied (SAV)

Slovakia (SK)

How to cite

APA:

Ognev, A.V., Kolesnikov, A.G., Kim, Y.J., Cha, I.H., Sadovnikov, A.V., Nikitov, S.A.,... Samardak, A.S. (2020). Magnetic direct-write skyrmion nanolithography. ACS nano, 14(11), 14960-14970. https://doi.org/10.1021/acsnano.0c04748

MLA:

Ognev, Alexey V, et al. "Magnetic direct-write skyrmion nanolithography." ACS nano 14.11 (2020): 14960-14970.

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