Covalent Patterning of 2D MoS2

Chen X, Kohring M, Assebban M, Tywoniuk B, Bartlam C, Moses Badlyan N, Maultzsch J, Duesberg GS, Weber HB, Knirsch K, Hirsch A (2021)


Publication Type: Journal article

Publication year: 2021

Journal

DOI: 10.1002/chem.202102021

Abstract

The development of an efficient method to patterning 2D MoS2 into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionalization. This strategy allows us to generate delicate MoS2 ribbon patterns with a minimum feature size of 2 μm in a high throughput rate. The patterned monolayer MoS2 domain consists of a spatially well-defined heterophase homojunction and alternately distributed surface characteristics, which holds great interest for further exploration of MoS2 based devices.

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APA:

Chen, X., Kohring, M., Assebban, M., Tywoniuk, B., Bartlam, C., Moses Badlyan, N.,... Hirsch, A. (2021). Covalent Patterning of 2D MoS2. Chemistry - A European Journal. https://doi.org/10.1002/chem.202102021

MLA:

Chen, Xin, et al. "Covalent Patterning of 2D MoS2." Chemistry - A European Journal (2021).

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