Resonant metamaterials for contrast enhancement in optical lithography

Dobmann S, Shyroki D, Banzer P, Erdmann A, Peschel U (2012)

Publication Type: Journal article

Publication year: 2012

Journal

Optics Express Optical Society of America

Book Volume: 20

Article Number: 19928

Journal Issue: 18

DOI: 10.1364/OE.20.019928

Abstract

The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated.

Authors with CRIS profile

Peter Banzer Lehrstuhl für Experimentalphysik Ulf Peschel Professur für Experimentalphysik

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials (EAM)

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE) Max-Planck-Institut für die Physik des Lichts (MPL) / Max Planck Institute for the Science of Light DE Germany (DE)

How to cite

APA:

Dobmann, S., Shyroki, D., Banzer, P., Erdmann, A., & Peschel, U. (2012). Resonant metamaterials for contrast enhancement in optical lithography. Optics Express, 20(18). https://doi.org/10.1364/OE.20.019928

MLA:

Dobmann, Sabine, et al. "Resonant metamaterials for contrast enhancement in optical lithography." Optics Express 20.18 (2012).

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