Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere

Ruff T, Hahn R, Killian MS, Asoh H, Ono S, Schmuki P (2012)


Publication Type: Journal article

Publication year: 2012

Journal

Book Volume: 62

Pages Range: 402-407

DOI: 10.1016/j.electacta.2011.12.045

Abstract

Niobium oxide films with a thickness of approximately 165~nm were prepared by electrochemical anodization. These anodic oxide layers were then treated in an ammonia atmosphere at different temperatures and durations, and characterized with XRD, XPS, ToF-SIMS and photoelectrochemical methods. Under optimized conditions nitrogen doping of the niobium oxide films takes place, resulting in a distinct photo response in the visible range of light.

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APA:

Ruff, T., Hahn, R., Killian, M.S., Asoh, H., Ono, S., & Schmuki, P. (2012). Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere. Electrochimica Acta, 62, 402-407. https://doi.org/10.1016/j.electacta.2011.12.045

MLA:

Ruff, T., et al. "Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere." Electrochimica Acta 62 (2012): 402-407.

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