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Modeling the evolution of ellipsometric data during the thermally induced Pt-silicide formation: activation energies and prefactors

Ley L, Hundhausen M (1999)

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Publication Type: Conference contribution

Publication year: 1999

Journal

Publisher: Materials Research Society

Edited Volumes: Materials Research Society Symposium - Proceedings

Pages Range: 145

Conference Proceedings Title: Symposium. Materials Research Society

Event location: San Francisco

Abstract

The formation of Pt silicide (PtSi) by the thermally activated reaction of a 23 nm Pt layer on Si was monitored in situ by ellipsometry. Characteristic changes in the ellipsometric angles as a function of temperature signal the approach of two reaction fronts to the surface: one belonging to the Pt/Pt2Si and the other to the Pt2Si/PtSi interface. An analysis of the evolution of the ellipsometric angles as a function of temperature for different heating rates allows the accurate determination of the average activation energies of the two reactions. From a modeling of the optical data in terms of a specific reaction model further kinetic parameters such as the reaction rate constants and the actual distribution of activation energies have been deduced.

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How to cite

APA:

Ley, L., & Hundhausen, M. (1999). Modeling the evolution of ellipsometric data during the thermally induced Pt-silicide formation: activation energies and prefactors. In Symposium. Materials Research Society (pp. 145). San Francisco: Materials Research Society.

MLA:

Ley, Lothar, and Martin Hundhausen. "Modeling the evolution of ellipsometric data during the thermally induced Pt-silicide formation: activation energies and prefactors." Proceedings of the In Situ Process Diagnostics and Modelling, San Francisco Materials Research Society, 1999. 145.

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