Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings

Förthner M, Rumler M, Stumpf F, Fader R, Rommel M, Frey L, Girschikofsky M, Belle S, Hellmann R, Klein JJ (2016)

Publication Status: Published

Publication Type: Journal article

Publication year: 2016

Journal

Applied Physics A: Materials Science and Processing Springer Verlag (Germany)

Publisher: SPRINGER

Book Volume: 122

Journal Issue: 3

DOI: 10.1007/s00339-016-9767-6

Abstract

In this work, we present an approach to use UV-enhanced substrate conformal imprint lithography (UV-SCIL) as a soft imprint technique combined with excimer laser irradiation to manufacture Bragg gratings within planar waveguides on a full-wafer scale. For the first time, different hybrid polymers (OrmoComp (R), OrmoStamp, OrmoCore, OrmoClad and OrmoClear) could be successfully patterned using UV-SCIL. For OrmoComp (R) (showing results very similar to OrmoStamp and OrmoClad), a complete imprint process could be realized. OrmoCore formed an inhibition layer in the presence of oxygen during the imprint, as could be observed for the use of OrmoClear as well. Processing options were elaborated to reduce the inhibition effect significantly, whereby the latter is mainly due to the atmospheric oxygen-containing PDMS layer of the UV-SCIL working stamp. Further on, the successful realization of a planar Bragg grating operating at the telecom wavelength is demonstrated by tuning the refractive index (RI) of OrmoComp (R) using a phase mask and an UV excimer laser. FTIR measurements show that the change in RI can be clearly correlated with a change in the chemical composition of the hybrid polymer during laser exposure.

Authors with CRIS profile

Michael Förthner Lehrstuhl für Elektronische Bauelemente Maximilian Rumler Lehrstuhl für Elektronische Bauelemente Lothar Frey Lehrstuhl für Elektronische Bauelemente

Related research project(s)

Hybrid polymer based Bragg grating sensors - Fundamental investigations and application (FR 713/10-2) Oct. 1, 2013 - Oct. 1, 2016

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE) Hochschule Aschaffenburg DE Germany (DE) micro resist technology GmbH DE Germany (DE)

How to cite

APA:

Förthner, M., Rumler, M., Stumpf, F., Fader, R., Rommel, M., Frey, L.,... Klein, J.J. (2016). Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings. Applied Physics A: Materials Science and Processing, 122(3). https://doi.org/10.1007/s00339-016-9767-6

MLA:

Förthner, Michael, et al. "Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings." Applied Physics A: Materials Science and Processing 122.3 (2016).

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