Waldmann D, Butz B, Bauer S, Englert J, Jobst J, Ullmann K, Fromm F, Ammon MM, Enzelberger-Heim M, Hirsch A, Maier S, Schmuki P, Seyller T, Spiecker E, Weber HB, Spiecker E (2013)
Publication Type: Journal article
Publication year: 2013
Original Authors: Waldmann D, Butz B, Bauer S, Englert JM, Jobst J, Ullmann K, Fromm F, Ammon M, Enzelberger M, Hirsch A, Maier S, Schmuki P, Seyller T, Spiecker E, Weber HB
Publisher: American Chemical Society
Book Volume: 7
Pages Range: 4441-4448
Journal Issue: 5
DOI: 10.1021/nn401037c
We present a fabrication process for freely suspended membranes consisting of bi- and trilayer graphene grown on silicon carbide. The procedure, involving photoelectrochemical etching, enables the simultaneous fabrication of hundreds of arbitrarily shaped membranes with an area up to 500 μm(2) and a yield of around 90%. Micro-Raman and atomic force microscopy measurements confirm that the graphene layer withstands the electrochemical etching and show that the membranes are virtually unstrained. The process delivers membranes with a cleanliness suited for high-resolution transmission electron microscopy (HRTEM) at atomic scale. The membrane, and its frame, is very robust with respect to thermal cycling above 1000 °C as well as harsh acidic or alkaline treatment.
APA:
Waldmann, D., Butz, B., Bauer, S., Englert, J., Jobst, J., Ullmann, K.,... Spiecker, E. (2013). Robust graphene membranes in a silicon carbide frame. ACS nano, 7(5), 4441-4448. https://doi.org/10.1021/nn401037c
MLA:
Waldmann, Daniel, et al. "Robust graphene membranes in a silicon carbide frame." ACS nano 7.5 (2013): 4441-4448.
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