Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes

Murakami K, Rommel M, Hudec B, Rosova A, Husekova K, Dobrocka E, Rammula R, Kasikov A, Han JH, Lee W, Song SJ, Paskaleva A, Bauer AJ, Frey L, Froehlich K, Aarik J, Hwang CS (2014)


Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2014

Journal

Book Volume: 6

Pages Range: 2486-2492

Journal Issue: 4

DOI: 10.1021/am4049139

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How to cite

APA:

Murakami, K., Rommel, M., Hudec, B., Rosova, A., Husekova, K., Dobrocka, E.,... Hwang, C.S. (2014). Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes. ACS Applied Materials and Interfaces, 6(4), 2486-2492. https://doi.org/10.1021/am4049139

MLA:

Murakami, Katsuhisa, et al. "Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes." ACS Applied Materials and Interfaces 6.4 (2014): 2486-2492.

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