Investigation of mass transport during SiC PVT growth using digital X-Ray Imaging, 13C labeling of source material and numerical modeling

Durst F, Hundhausen M, Winnacker A, Ley L (2003)


Publication Type: Journal article

Publication year: 2003

Journal

Publisher: Trans Tech Publications

Book Volume: 433-436

Pages Range: 9

Abstract

We have analyzed the mass transport during physical vapor transport growth of SiC using 13C for labeling of the SiC gas species (i.e. Si 2C and SiC2) paths and digital x-ray imaging in order to monitor the evolution of the SiC crystal and SiC source material. The distribution of Si13C was investigated after growth by Micro-Raman spectroscopy. The slow onset of the 13C incorporation into the SiC crystal as well as the enrichment of 13C in the residual source material indicate that the major mass transport is conducted through the center of the source material and not along the hot crucible walls where SiC consumption is observed first. Numerical modeling of sublimation and recrystallization inside the SiC source material has been carried out. Effects like the formation of a condensed disk on top of the source material, consumption of SiC close to the hot crucible walls, etc. are described well. The experimental as well as numerical methods are believed to be useful tools for scaling up current growth setups towards large single crystal diameters.

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How to cite

APA:

Durst, F., Hundhausen, M., Winnacker, A., & Ley, L. (2003). Investigation of mass transport during SiC PVT growth using digital X-Ray Imaging, 13C labeling of source material and numerical modeling. Materials Science Forum, 433-436, 9.

MLA:

Durst, Franz, et al. "Investigation of mass transport during SiC PVT growth using digital X-Ray Imaging, 13C labeling of source material and numerical modeling." Materials Science Forum 433-436 (2003): 9.

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