Ristein J, Ley L (1993)
Publication Type: Conference contribution
Publication year: 1993
Publisher: Materials Research Society
Edited Volumes: Materials Research Society Symposium Proceedings
Book Volume: 297
Pages Range: 207
Conference Proceedings Title: MRS Proceedings
Event location: Pitsburg
Photoelectron Yield Spectroscopy is one of the most direct methods to study the density of gap states of amorphous semiconductors. We have made use of it to investigate the transient changes of the density of gap states of a-Si:H upon illumination with above-band-gap light. An excitation density of 50 mW/cm2 of 532 nm light from a frequency doubled Nd-YAG laser was modulated with frequencies between 0.1 Hz and 10 KHz and the transient response of the photoelectron yield signal was monitored by gated electron counting or a lock-in amplifier. From this we deduce a reversible increase of the occupied density of defect states under illumination with a maximum Δg to approximately 1017 cm-3 eV-1 at about 0.3 eV below the Fermi energy and a decrease below E
APA:
Ristein, J., & Ley, L. (1993). Signature of the weak bond-dangling bond conversion process in a-Si:H as seen by total photoelectron yield spectroscopy. In MRS Proceedings (pp. 207). Pitsburg: Materials Research Society.
MLA:
Ristein, Jürgen, and Lothar Ley. "Signature of the weak bond-dangling bond conversion process in a-Si:H as seen by total photoelectron yield spectroscopy." Proceedings of the Amorphous Silicon Technology, Pitsburg Materials Research Society, 1993. 207.
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