Finding activation pathway of coupled displacive-diffusional defect processes in atomistics: Dislocation climb in fcc copper

Sarkar S, Li J, Cox WT, Bitzek E, Lenosky TJ, Wang Y (2012)

Publication Type: Journal article

Publication year: 2012

Journal

Physical Review B American Physical Society

Book Volume: 86

Journal Issue: 1

DOI: 10.1103/PhysRevB.86.014115

Authors with CRIS profile

Erik Bitzek Professur für Datenbasierte Materialmodellierung

Additional Organisation(s)

Lehrstuhl für Werkstoffwissenschaften (Allgemeine Werkstoffeigenschaften)

Involved external institutions

Ohio State University US United States (USA) (US) Massachusetts Institute of Technology (MIT) US United States (USA) (US)

How to cite

APA:

Sarkar, S., Li, J., Cox, W.T., Bitzek, E., Lenosky, T.J., & Wang, Y. (2012). Finding activation pathway of coupled displacive-diffusional defect processes in atomistics: Dislocation climb in fcc copper. Physical Review B, 86(1). https://doi.org/10.1103/PhysRevB.86.014115

MLA:

Sarkar, Sanket, et al. "Finding activation pathway of coupled displacive-diffusional defect processes in atomistics: Dislocation climb in fcc copper." Physical Review B 86.1 (2012).

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