Mechanism of etching and surface relief development of PMMA under low-energy ion bombardment

Koval Y (2004)


Publication Language: English

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2004

Journal

Book Volume: 22

Pages Range: 843-851

Journal Issue: 2

DOI: 10.1116/1.1689306

Abstract

The structure of the subsurface layer of polymethylmethacrylate (PMMA) formed by bombardment with low-energy ions of Ar was studied. The reduction in the energy of ions results in the modification of only a thin subsurface layer of a polymer. It was observed that the subsurface region contains a graphitized, cross-linked, and low-molecular weight layers. It was found that the ion etching causes various defects and typical features to appear on the surface of PMMA.

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How to cite

APA:

Koval, Y. (2004). Mechanism of etching and surface relief development of PMMA under low-energy ion bombardment. Journal of Vacuum Science & Technology B, 22(2), 843-851. https://dx.doi.org/10.1116/1.1689306

MLA:

Koval, Yury. "Mechanism of etching and surface relief development of PMMA under low-energy ion bombardment." Journal of Vacuum Science & Technology B 22.2 (2004): 843-851.

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