Quantifying eigenstrain distributions induced by focused ion beam damage in silicon

Korsunsky A, Guenole J, Salvati E, Sui T, Mousavi M, Prakash A, Bitzek E (2016)


Publication Language: English

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2016

Journal

Publisher: Elsevier B.V.

Book Volume: 185

Pages Range: 47-49

DOI: 10.1016/j.matlet.2016.08.111

Abstract

Eigenstrain offers a versatile generic framework for the description of inelastic deformation that acts as the source of residual stresses. Focused ion beam (FIB) milling used for nanoscale machining is accompanied by target material modification by ion beam damage having residual stress consequences that can be described in terms of eigenstrain. Due to the lack of direct means of experimental determination of residual stress or eigenstrain at the nanoscale we adopt a hybrid approach that consists of eigenstrain abstraction from molecular dynamics simulation, its application within a finite element simulation of a flexible silicon cantilever, and satisfactory comparison of the prediction with experimental observation. Directions for further enquiry are briefly discussed.

Authors with CRIS profile

Additional Organisation(s)

Involved external institutions

How to cite

APA:

Korsunsky, A., Guenole, J., Salvati, E., Sui, T., Mousavi, M., Prakash, A., & Bitzek, E. (2016). Quantifying eigenstrain distributions induced by focused ion beam damage in silicon. Materials Letters, 185, 47-49. https://doi.org/10.1016/j.matlet.2016.08.111

MLA:

Korsunsky, Alexander, et al. "Quantifying eigenstrain distributions induced by focused ion beam damage in silicon." Materials Letters 185 (2016): 47-49.

BibTeX: Download