Developement of atomic layer deposition processes for gallium oxide and indium oxide (ALD Deposition)

Third party funded individual grant


Acronym: ALD Deposition

Start date : 01.06.2015

End date : 31.01.2016

Project details

Involved:

Julien Bachmann Project Leader

Contributing FAU Organisations:

Professur für Anorganische Chemie

Funding Source

Industrie IMRA Europe