Sicrystal AG
    Industry / private company
    
    
        Location: 
        Nürnberg,
        
                Germany (DE)
                
    
 
        
    
    
    
    
    
    
    
        
    
        
    
        
    
    
    
        
            
                
  
  Doping induced lattice misfit in 4H-SiC homoepitaxy (2012)
  Kallinger B, Berwian P, Friedrich J, Mueller G, Weber AD, Volz E, Trachta G, et al.
  Journal article
            
                
  
  Analysis on defect generation during the SiC bulk growth process (1999)
  Hofmann HD, Schmitt E, Bickermann M, Kölbl M, Wellmann P, Winnacker A
  Journal article, Original article