Journal of Applied Physics
Journal Abbreviation: J APPL PHYS
ISSN: 0021-8979
eISSN: 1089-7550
Publisher: AIP Publishing
Publications (185)
Transport properties of topologically non-trivial bismuth tellurobromides BinTeBr (2019)
Pabst F, Hobbis D, Alzahrani N, Wang H, Rusinov IP, Chulkov E, Martina J, et al.
Journal article
Quasi-antiferromagnetic multilayer stacks with 90 degree coupling mediated by thin Fe oxide spacers (2019)
Nagashima G, Kurokawa Y, Zhong Y, Horiike S, Schoenke D, Krautscheid P, Reeve R, et al.
Journal article
Interaction of semiconductor metasurfaces with short laser pulses: From nonlinear-optical response toward spatiotemporal shaping (2019)
Shcherbakov MR, Eilenberger F, Staude I
Journal article
Straintronics in graphene: Extra large electronic band gap induced by tensile and shear strains (2019)
Sahalianov IY, Radchenko TM, Tatarenko VA, Cuniberti G, Prylutskyy Y
Journal article
Deeper insight into lifetime-engineering in 4H-SiC by ion implantation (2019)
Erlekampf J, Kallinger B, Weiße J, Rommel M, Berwian P, Friedrich J, Erlbacher T
Journal article
Controlling the p-type conductivity of SnO by doping with nitrogen and hydrogen (2019)
Becker M, Hamann R, Hartung D, Voget-Grote C, Graubner S, Hoffmann P, Ronning C, et al.
Journal article
Elastic properties and stability of Heusler compounds: Cubic Co2YZ compounds with L 21structure (2019)
Wu SC, Fecher GH, Naghavi SS, Felser C
Journal article
Impact of Bi incorporation on the evolution of microstructure during growth of low-temperature GaAs:Bi/Ga(As,Bi) layers (2019)
Luna E, Wu M, Aoki T, McCartney MR, Puustinen J, Hilska J, Guina M, et al.
Journal article, Original article
Perspective: Magnetic skyrmions - Overview of recent progress in an active research field (2018)
Everschor-Sitte K, Masell J, Reeve RM, Klaeui M
Journal article
Pressure-tuning of the magnetic properties of the Heusler compound Mn2PtGa (2018)
Mejia CS, Nayak AK, Felser C, Nicklas M
Journal article