Impact of Epitaxial Defects on Device Behavior and their Correlation to the Reverse Characteristics of SiC Devices
Kodolitsch E, Sodan V, Krieger M, Tsavdaris N (2022)
Publication Type: Journal article
Publication year: 2022
Journal
Book Volume: 1062
Pages Range: 49-53
DOI: 10.4028/p-f26rb5
Abstract
In this work we report on the impact of various crystalline defects present in 4H-SiC epitaxial layers on the electrical blocking characteristics of SiC power devices. Dedicated test structures were fabricated and electrically characterized in reverse bias mode. SiC substrate and epitaxial crystal defects, as well defects due to front-end processing were detected and classified using commercial inspection tools. Devices with a single defect-type were studied which leads to a direct correlation of the leakage current spot position within the device and the obtained blocking characteristics. This gives a better understanding of each crystal defect impact on device ́s performance which leads to an improvement in the reliability and cost reduction of SiC power devices.
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Austria (AT)How to cite
APA:
Kodolitsch, E., Sodan, V., Krieger, M., & Tsavdaris, N. (2022). Impact of Epitaxial Defects on Device Behavior and their Correlation to the Reverse Characteristics of SiC Devices. Materials Science Forum, 1062, 49-53. https://dx.doi.org/10.4028/p-f26rb5
MLA:
Kodolitsch, Elisabeth, et al. "Impact of Epitaxial Defects on Device Behavior and their Correlation to the Reverse Characteristics of SiC Devices." Materials Science Forum 1062 (2022): 49-53.
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