Covalent Patterning of 2D MoS2
Chen X, Kohring M, Assebban M, Tywoniuk B, Bartlam C, Moses Badlyan N, Maultzsch J, Duesberg GS, Weber HB, Knirsch K, Hirsch A (2021)
Publication Type: Journal article
Publication year: 2021
Journal
Abstract
The development of an efficient method to patterning 2D MoS2 into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionalization. This strategy allows us to generate delicate MoS2 ribbon patterns with a minimum feature size of 2 μm in a high throughput rate. The patterned monolayer MoS2 domain consists of a spatially well-defined heterophase homojunction and alternately distributed surface characteristics, which holds great interest for further exploration of MoS2 based devices.
Authors with CRIS profile
Xin Chen
Lehrstuhl für Organische Chemie II
Malte Kohring
Chair of Applied Physics
M'hamed Assebban
Lehrstuhl für Organische Chemie II
Narine Moses Badlyan
Lehrstuhl für Experimentalphysik
Janina Maultzsch
Lehrstuhl für Experimentalphysik
Heiko Weber
Chair of Applied Physics
Kathrin Knirsch
Lehrstuhl für Organische Chemie II
Andreas Hirsch
Lehrstuhl für Organische Chemie II
Involved external institutions
Germany (DE)How to cite
APA:
Chen, X., Kohring, M., Assebban, M., Tywoniuk, B., Bartlam, C., Moses Badlyan, N.,... Hirsch, A. (2021). Covalent Patterning of 2D MoS2. Chemistry - A European Journal. https://doi.org/10.1002/chem.202102021
MLA:
Chen, Xin, et al. "Covalent Patterning of 2D MoS2." Chemistry - A European Journal (2021).
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