Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents

Jank M, Frey L, Bauer A, Ryssel H (2002)

Publication Status: Published

Publication Type: Conference contribution, Conference Contribution

Publication year: 2002

Publisher: Institute of Electrical and Electronics Engineers Inc.

Pages Range: 197-200

Article Number: 1257972

ISBN: 0780371550

DOI: 10.1109/IIT.2002.1257972

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente Heiner Ryssel Technische Fakultät

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE)

How to cite

APA:

Jank, M., Frey, L., Bauer, A., & Ryssel, H. (2002). Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents. In Proceedings of the 2002 14th IEEE International Conference on Ion Implantation Technology, IIT 2002 (pp. 197-200). Institute of Electrical and Electronics Engineers Inc..

MLA:

Jank, Michael, et al. "Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents." Proceedings of the 2002 14th IEEE International Conference on Ion Implantation Technology, IIT 2002 Institute of Electrical and Electronics Engineers Inc., 2002. 197-200.

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