Rapid Anodic Formation of High Aspect Ratio WO 3 Layers with Self-Ordered Nanochannel Geometry and Use in Photocatalysis

Wei W, Shaw S, Lee K, Schmuki P (2012)

Publication Type: Journal article

Publication year: 2012

Journal

Chemistry - A European Journal Wiley

Book Volume: 18

Pages Range: 14622-14626

Journal Issue: 46

DOI: 10.1002/chem.201202420

Abstract

The formation of WO3 layers with an aligned nanochannel morphology by using self-organizing anodization of a tungsten metal substrate is demonstrated. The nanochannel layers with diameters of approximately 9nm can be grown to about 10\textgreekmm thickness. Layers optimized for length and structure are promising for visible-light photocatalytic applications, such as water-splitting photoanodes.

Authors with CRIS profile

Santosh Shaw Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik) Kiyoung Lee Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik) Patrik Schmuki Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik)

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials

How to cite

APA:

Wei, W., Shaw, S., Lee, K., & Schmuki, P. (2012). Rapid Anodic Formation of High Aspect Ratio WO 3 Layers with Self-Ordered Nanochannel Geometry and Use in Photocatalysis. Chemistry - A European Journal, 18(46), 14622-14626. https://dx.doi.org/10.1002/chem.201202420

MLA:

Wei, Wei, et al. "Rapid Anodic Formation of High Aspect Ratio WO 3 Layers with Self-Ordered Nanochannel Geometry and Use in Photocatalysis." Chemistry - A European Journal 18.46 (2012): 14622-14626.

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