Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere

Ruff T, Hahn R, Killian MS, Asoh H, Ono S, Schmuki P (2012)

Publication Type: Journal article

Publication year: 2012

Journal

Electrochimica Acta Elsevier

Book Volume: 62

Pages Range: 402-407

DOI: 10.1016/j.electacta.2011.12.045

Abstract

Niobium oxide films with a thickness of approximately 165~nm were prepared by electrochemical anodization. These anodic oxide layers were then treated in an ammonia atmosphere at different temperatures and durations, and characterized with XRD, XPS, ToF-SIMS and photoelectrochemical methods. Under optimized conditions nitrogen doping of the niobium oxide films takes place, resulting in a distinct photo response in the visible range of light.

Authors with CRIS profile

Robert Hahn Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik) Patrik Schmuki Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik)

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials

Involved external institutions

Kogakuin University / 工学院大学 JP Japan (JP)

How to cite

APA:

Ruff, T., Hahn, R., Killian, M.S., Asoh, H., Ono, S., & Schmuki, P. (2012). Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere. Electrochimica Acta, 62, 402-407. https://dx.doi.org/10.1016/j.electacta.2011.12.045

MLA:

Ruff, T., et al. "Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere." Electrochimica Acta 62 (2012): 402-407.

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