Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes

Murakami K, Rommel M, Hudec B, Rosova A, Husekova K, Dobrocka E, Rammula R, Kasikov A, Han JH, Lee W, Song SJ, Paskaleva A, Bauer AJ, Frey L, Froehlich K, Aarik J, Hwang CS (2014)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2014

Journal

ACS Applied Materials and Interfaces American Chemical Society

Book Volume: 6

Pages Range: 2486-2492

Journal Issue: 4

DOI: 10.1021/am4049139

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente

Involved external institutions

Slovak Academy of Sciences (SAS) / Slovenská akadémia vied (SAV)

Slovakia (SK) Seoul National University (SNU) / 서울대학교

Korea, Republic of (KR) University of Tartu

Estonia (EE) Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB)

Germany (DE) Bulgarian Academy of Sciences (BAS) / Българска академия на науките

Bulgaria (BG)

How to cite

APA:

Murakami, K., Rommel, M., Hudec, B., Rosova, A., Husekova, K., Dobrocka, E.,... Hwang, C.S. (2014). Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes. ACS Applied Materials and Interfaces, 6(4), 2486-2492. https://dx.doi.org/10.1021/am4049139

MLA:

Murakami, Katsuhisa, et al. "Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes." ACS Applied Materials and Interfaces 6.4 (2014): 2486-2492.

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