Electrical nanocharacterization of epitaxial graphene/silicon carbide Schottky contacts

Giannazzo F, Hertel S, Albert A, La Magna A, Roccaforte F, Krieger M, Weber HB (2014)


Publication Type: Journal article

Publication year: 2014

Journal

Publisher: Trans Tech Publications

Book Volume: 778-780

Pages Range: 1142-1145

DOI: 10.4028/www.scientific.net/MSF.778-780.1142

Abstract

Epitaxial graphene fabricated by thermal decomposition of the Si-face of silicon carbide (SiC) forms a defined interface to the SiC substrate. As-grown monolayer graphene with buffer layer establishes an ohmic interface even to low-doped (e. g. [N] ≈ 1015 cm-3) SiC, and a specific contact resistance as low as ρC = 5.9×10-6 Ωcm2 can be achieved on highly n-doped SiC layers. After hydrogen intercalation of monolayer graphene, the so-called quasi-freestanding graphene forms a Schottky contact to n-type SiC with a Schottky barrier height of 1.5 eV as determined from C-V analysis and core level photoelectron spectroscopy (XPS). This value, however, strongly deviates from the respective value of less than 1 eV determined from I-V measurements. It was found from conductive atomic force microscopy (C-AFM) that the Schottky barrier is locally lowered on other crystal facets located at substrate step edges. For very small Schottky contacts, the barrier height extracted from I-V curves approaches the value of 1.5 eV from C-V and XPS. © (2014) Trans Tech Publications, Switzerland.

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APA:

Giannazzo, F., Hertel, S., Albert, A., La Magna, A., Roccaforte, F., Krieger, M., & Weber, H.B. (2014). Electrical nanocharacterization of epitaxial graphene/silicon carbide Schottky contacts. Materials Science Forum, 778-780, 1142-1145. https://doi.org/10.4028/www.scientific.net/MSF.778-780.1142

MLA:

Giannazzo, Filippo, et al. "Electrical nanocharacterization of epitaxial graphene/silicon carbide Schottky contacts." Materials Science Forum 778-780 (2014): 1142-1145.

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