A model of self-limiting residual acid diffusion for pattern doubling

Erdmann A, Fuhrmann J, Fiebach A, Uhle M, Szmanda C, Truong C (2009)

Publication Type: Journal article

Publication year: 2009

Journal

Microelectronic Engineering Elsevier

Book Volume: 86

Pages Range: 792

DOI: 10.1016/j.mee.2008.10.023

How to cite

APA:

Erdmann, A., Fuhrmann, J., Fiebach, A., Uhle, M., Szmanda, C., & Truong, C. (2009). A model of self-limiting residual acid diffusion for pattern doubling. Microelectronic Engineering, 86, 792. https://dx.doi.org/10.1016/j.mee.2008.10.023

MLA:

Erdmann, Andreas, et al. "A model of self-limiting residual acid diffusion for pattern doubling." Microelectronic Engineering 86 (2009): 792.

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