Baer E, Kunder D, Evanschitzky P, Lorenz J (2010)
Publication Type: Conference contribution, Conference Contribution
Publication year: 2010
Book Volume: 03-B4
Pages Range: 57
Conference Proceedings Title: Proceedings of SISPAD 2010
Event location: Bologna
APA:
Baer, E., Kunder, D., Evanschitzky, P., & Lorenz, J. (2010). Coupling of Equipment and Feature-Scale Profile Simulation for Dry-Etching of Polysilicon Gate Lines. In Proceedings of SISPAD 2010 (pp. 57). Bologna.
MLA:
Baer, Eberhard, et al. "Coupling of Equipment and Feature-Scale Profile Simulation for Dry-Etching of Polysilicon Gate Lines." Proceedings of the Workshop, Bologna 2010. 57.
BibTeX: Download