Coupling of Equipment and Feature-Scale Profile Simulation for Dry-Etching of Polysilicon Gate Lines - Baer, Eberhard; Kunder, D.; Evanschitzky, Peter; Lorenz, Jürgen (Proceedings of SISPAD 2010, 2010)
UnivIS-Import:2017-07-10:Pub.2010.tech.IE.LEB.coupli_6