Thin membranes versus bulk substrates: Investigation of proximity effects in focused electron beam-induced processing

Walz MM, Vollnhals F, Rietzler F, Schirmer M, Kunzmann A, Steinrück HP, Marbach H (2012)

Publication Type: Journal article

Publication year: 2012

Journal

Original Authors: Walz M.-M., Vollnhals F., Rietzler F., Schirmer M., Kunzmann A., Steinrück H.-P., Marbach H.

Publisher: Institute of Physics: Hybrid Open Access

Book Volume: 45

Article Number: 225306

Journal Issue: 22

DOI: 10.1088/0022-3727/45/22/225306

Abstract

The resolution of focused electron beam induced processing techniques is limited by electron scattering processes. General wisdom holds that using a membrane, this can be effectively improved due to a cutoff of the electron interaction volume and thus diminished proximity effects. Recently, we demonstrated that in contrast to the expectation, proximity effects can be indeed larger on a 200nm silicon nitride membrane than on the respective bulk substrate, due to charging-induced surface activation. Herein, we expand these investigations on proximity effects in electron beam-induced surface activation to other substrates and to electron beam-induced deposition followed by autocatalytic growth. © 2012 IOP Publishing Ltd.

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APA:

Walz, M.-M., Vollnhals, F., Rietzler, F., Schirmer, M., Kunzmann, A., Steinrück, H.-P., & Marbach, H. (2012). Thin membranes versus bulk substrates: Investigation of proximity effects in focused electron beam-induced processing. Journal of Physics D-Applied Physics, 45(22). https://doi.org/10.1088/0022-3727/45/22/225306

MLA:

Walz, Marie-Madeleine, et al. "Thin membranes versus bulk substrates: Investigation of proximity effects in focused electron beam-induced processing." Journal of Physics D-Applied Physics 45.22 (2012).

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