Effect of barium contamination on gate oxide integrity in high-k dram

Boubekeur H, Mikolajick T, Bauer A, Frey L, Ryssel H (2002)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2002

Journal

Journal of Non-Crystalline Solids Elsevier

Book Volume: 303

Pages Range: 12-16

Journal Issue: 1

DOI: 10.1016/S0022-3093(02)00957-2

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente Heiner Ryssel Technische Fakultät

Involved external institutions

NaMLab gGmbH DE Germany (DE) Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE)

How to cite

APA:

Boubekeur, H., Mikolajick, T., Bauer, A., Frey, L., & Ryssel, H. (2002). Effect of barium contamination on gate oxide integrity in high-k dram. Journal of Non-Crystalline Solids, 303(1), 12-16. https://doi.org/10.1016/S0022-3093(02)00957-2

MLA:

Boubekeur, H., et al. "Effect of barium contamination on gate oxide integrity in high-k dram." Journal of Non-Crystalline Solids 303.1 (2002): 12-16.

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