Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings

Journal article


Publication Details

Author(s): Förthner M, Rumler M, Stumpf F, Fader R, Rommel M, Frey L, Girschikofsky M, Belle S, Hellmann R, Klein JJ
Journal: Applied Physics A-Materials Science & Processing
Publisher: SPRINGER
Publication year: 2016
Volume: 122
Journal issue: 3
ISSN: 0947-8396


Abstract


In this work, we present an approach to use UV-enhanced substrate conformal imprint lithography (UV-SCIL) as a soft imprint technique combined with excimer laser irradiation to manufacture Bragg gratings within planar waveguides on a full-wafer scale. For the first time, different hybrid polymers (OrmoComp (R), OrmoStamp, OrmoCore, OrmoClad and OrmoClear) could be successfully patterned using UV-SCIL. For OrmoComp (R) (showing results very similar to OrmoStamp and OrmoClad), a complete imprint process could be realized. OrmoCore formed an inhibition layer in the presence of oxygen during the imprint, as could be observed for the use of OrmoClear as well. Processing options were elaborated to reduce the inhibition effect significantly, whereby the latter is mainly due to the atmospheric oxygen-containing PDMS layer of the UV-SCIL working stamp. Further on, the successful realization of a planar Bragg grating operating at the telecom wavelength is demonstrated by tuning the refractive index (RI) of OrmoComp (R) using a phase mask and an UV excimer laser. FTIR measurements show that the change in RI can be clearly correlated with a change in the chemical composition of the hybrid polymer during laser exposure.



FAU Authors / FAU Editors

Förthner, Michael
Lehrstuhl für Elektronische Bauelemente
Frey, Lothar Prof. Dr.
Lehrstuhl für Elektronische Bauelemente
Rumler, Maximilian
Lehrstuhl für Elektronische Bauelemente


External institutions with authors

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB)
Hochschule Aschaffenburg
micro resist technology GmbH


How to cite

APA:
Förthner, M., Rumler, M., Stumpf, F., Fader, R., Rommel, M., Frey, L.,... Klein, J.J. (2016). Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings. Applied Physics A-Materials Science & Processing, 122(3). https://dx.doi.org/10.1007/s00339-016-9767-6

MLA:
Förthner, Michael, et al. "Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings." Applied Physics A-Materials Science & Processing 122.3 (2016).

BibTeX: 

Last updated on 2019-18-07 at 07:29

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