Fabrication and Application of Phase only Holograms for High Power Laser Beam Shaping

Journal article
(Original article)


Publication Details

Author(s): Alexeev I, Brehm E, Nendel F, Strauß J, Baum M, Schmidt M
Journal: Journal of Laser Micro Nanoengineering
Publication year: 2016
Volume: 11
Journal issue: 2
Pages range: 261-265
ISSN: 1880-0688
Language: English


Abstract


Fabrication of phase only holograms via spatially selective ablation of an ITO nanoparticulate layer coated on an optical quality transparent substrate appears to be very attractive due to the simplicity and flexibility of this approach. A pre-calculated binary pattern can be directly written on such a layer in order to produce a desired intensity distribution in the focal plane of a focusing lens. In this contribution we analyze the performance of the fabricated holograms and their suitability for high power beam shaping as well as propose a way to improve the diffraction efficiency of such structures by transitioning from a single to multi-layer holograms.



FAU Authors / FAU Editors

Alexeev, Ilya
Lehrstuhl für Photonische Technologien
Baum, Marcus
Lehrstuhl für Photonische Technologien
Schmidt, Michael Prof. Dr.-Ing.
Lehrstuhl für Photonische Technologien
Strauß, Johannes
Lehrstuhl für Photonische Technologien


How to cite

APA:
Alexeev, I., Brehm, E., Nendel, F., Strauß, J., Baum, M., & Schmidt, M. (2016). Fabrication and Application of Phase only Holograms for High Power Laser Beam Shaping. Journal of Laser Micro Nanoengineering, 11(2), 261-265. https://dx.doi.org/10.2961/jlmn.2016.02.0019

MLA:
Alexeev, Ilya, et al. "Fabrication and Application of Phase only Holograms for High Power Laser Beam Shaping." Journal of Laser Micro Nanoengineering 11.2 (2016): 261-265.

BibTeX: 

Last updated on 2018-15-06 at 10:10