Maximilian Rumler



Organisation


Lehrstuhl für Elektronische Bauelemente


Project member


(EXC 315: New Materials and Processes - Hierarchical Structure Formation for Functional Devices):
EXC 315/2: Engineering of Nanoelectronic Materials - B6 (Druckbare Elektronik)
Prof. Dr. Lothar Frey
(01/11/2012 - 31/10/2017)


Publications (Download BibTeX)


Förthner, M., Papenheim, M., Rumler, M., Stumpf, F., Baier, L., Rommel, M.,... Frey, L. (2017). Polymerization related deformations in multilayer soft stamps for nanoimprint. Journal of Applied Physics, 122(16). https://dx.doi.org/10.1063/1.5001463
Rumler, M., Kollmuss, M., Baier, L., Michel, F., Förthner, M., Becker, M.,... Frey, L. (2016). Combination of direct laser writing and soft lithography molds for combined nano- and microfabrication. SPIE-INT SOC OPTICAL ENGINEERING, PO BOX 10, BELLINGHAM, WA 98227-0010 USA.
Förthner, M., Rumler, M., Stumpf, F., Fader, R., Rommel, M., Frey, L.,... Klein, J.J. (2016). Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings. Applied Physics A-Materials Science & Processing, 122(3). https://dx.doi.org/10.1007/s00339-016-9767-6
Kaliya Perumal Veerapandian, S., Beuer, S., Rumler, M., Stumpf, F., Thomas, K., Pillatsch, L.,... Rommel, M. (2015). Comparison of silicon and 4H silicon carbide patterning using focused ion beams. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 365(365), 44-49. https://dx.doi.org/10.1016/j.nimb.2015.07.079
Scharin, M., Rommel, M., Dirnecker, T., Marhenke, J., Herrmann, B., Rumler, M.,... Herrmann, M. (2014). Bioactivation of plane and patterned PDMS thin films by wettability engineering. BioNanoScience, 4(3), 251-262. https://dx.doi.org/10.1007/s12668-014-0145-6
Landwehr, J., Fader, R., Rumler, M., Rommel, M., Bauer, A., Frey, L.,... Spiecker, E. (2014). Optical polymers with tunable refractive index for nanoimprint technologies. Nanotechnology, 25(50), Article number 505301. https://dx.doi.org/10.1088/0957-4484/25/50/505301
Fader, R., Rommel, M., Bauer, A., Rumler, M., Frey, L., Verschuuren, M.A.,... Schoembs, U. (2013). Accuracy of wafer level alignment with substrate conformal imprint lithography. Journal of Vacuum Science & Technology B, 31(6), 6FB02. https://dx.doi.org/10.1116/1.4824696
Rumler, M., Fader, R., Haas, A., Rommel, M., Bauer, A., & Frey, L. (2013). Evaluation of resistless Ga+ beam lithography for UV NIL stamp fabrication. Nanotechnology, 24(36), 365302. https://dx.doi.org/10.1088/0957-4484/24/36/365302
Fader, R., Landwehr, J., Rumler, M., Rommel, M., Bauer, A., Frey, L.,... Kraft, A. (2013). Functional epoxy polymer for direct nano-imprinting of micro-optical elements. Microelectronic Engineering, 110, 90-93. https://dx.doi.org/10.1016/j.mee.2013.02.030
Rommel, M., Rumler, M., Haas, A., Bauer, A.J., & Frey, L. (2013). Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching. Microelectronic Engineering, 110, 177-182. https://dx.doi.org/10.1016/j.mee.2013.03.081

Last updated on 2017-14-10 at 02:00