Publications (151,030)

Measurement of shallow arsenic impurity profiles in semiconductor silicon using time-of-flight secondary ion mass spectrometry and total reflection X-ray fluorescence spectrometry

Schwenke H, Knoth J, Fabry L, Pahlke S, Scholz R, Frey L (1997)

Journal article, Original article

Biró L, Gyulai J, Havancsák K, Didyk A, Frey L, Ryssel H (1997)

Journal article, Original article

Saggio M, Montandon C, Bourenkov A, Frey L, Pichler P (1997)

Journal article, Original article

Zetzsche C, Barth E, Krieger G, Wegmann B (1997)

Journal article

Caelli T, Dillon C, Osman E, Krieger G (1997)

Journal article

Mayerhofer R (1997)

Thesis

Krajewski M (1997)

Journal article

Thommes M (1997)

Journal article, Original article

Libuda J (1997)

Conference contribution

Wilke P (1997)

Thesis

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