Helmreich T, Göltz M, Vomhof E, Böhmler M, Englert JM, Rosiwal S (2025)
Publication Language: English
Publication Type: Journal article, Letter
Publication year: 2025
Book Volume: 240
Article Number: 114563
DOI: 10.1016/j.vacuum.2025.114563
Open Access Link: https://www.sciencedirect.com/science/article/pii/S0042207X25005536
We demonstrate the utility of Raman spectroscopy for in situ monitoring of material properties and behaviour
inside a reaction chamber. For the first time, the diamond layer deposited on a steel substrate was characterized
by in situ Raman spectroscopy during coating and subsequent cooling inside a HF-CVD reactor. This was achieved
by positioning a highly sensitive confocal Raman probe in front of a window in the reactor and recording Raman
spectra during the coating and the entire cooling process from 870 ◦C to 30 ◦ C. The thermal residual stress in the
diamond layer was directly quantified from the Raman data and verified by external dilatometer analysis.
Finally, conclusions about the phase transformations in the steel substrate were drawn. In situ monitoring of
temperature-dependent material properties yields valuable mechanistic insights, thus facilitating process opti-
mization, for example with the aim of minimizing stress in the diamond coating and maximizing the adherent
layer thickness.
APA:
Helmreich, T., Göltz, M., Vomhof, E., Böhmler, M., Englert, J.M., & Rosiwal, S. (2025). In situ Raman spectroscopy of thermal stress in diamond on steel during HF-CVD coating and subsequent quenching. Vacuum, 240. https://doi.org/10.1016/j.vacuum.2025.114563
MLA:
Helmreich, Thomas, et al. "In situ Raman spectroscopy of thermal stress in diamond on steel during HF-CVD coating and subsequent quenching." Vacuum 240 (2025).
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