Accessing the Nonlinear Regime with Selectively Laser Etched High-Q Microresonators
Bi T, Beckmann L, Thoms JM, Wenk M, Zhang S, Kratz M, Del'haye P (2024)
Publication Type: Conference contribution
Publication year: 2024
Publisher: Institute of Electrical and Electronics Engineers Inc.
Conference Proceedings Title: 16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024
Event location: Incheon, KOR
ISBN: 9798350372076
DOI: 10.1109/CLEO-PR60912.2024.10676883
Abstract
Fused silica microresonators fabricated with the selective laser etching and annealing process with high-Q factors is presented. Due to the high-Q factors, frequency comb generation, stimulated Raman scattering, and opto-mechanical instability are experimentally observed.
Involved external institutions
Max-Planck-Institut für die Physik des Lichts (MPL) / Max Planck Institute for the Science of Light
Germany (DE)
Fraunhofer-Institut für Lasertechnik (ILT)
Germany (DE)
Germany (DE)
Fraunhofer-Institut für Lasertechnik (ILT)
Germany (DE)
How to cite
APA:
Bi, T., Beckmann, L., Thoms, J.M., Wenk, M., Zhang, S., Kratz, M., & Del'haye, P. (2024). Accessing the Nonlinear Regime with Selectively Laser Etched High-Q Microresonators. In 16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024. Incheon, KOR: Institute of Electrical and Electronics Engineers Inc..
MLA:
Bi, Toby, et al. "Accessing the Nonlinear Regime with Selectively Laser Etched High-Q Microresonators." Proceedings of the 16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024, Incheon, KOR Institute of Electrical and Electronics Engineers Inc., 2024.
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