Reactive Deposition Versus Strong Electrostatic Adsorption (SEA): A Key to Highly Active Single Atom Co-Catalysts in Photocatalytic H2 Generation

Wang Y, Qin S, Denisov N, Kim H, Bad'ura Z, Sarma BB, Schmuki P (2023)


Publication Type: Journal article

Publication year: 2023

Journal

DOI: 10.1002/adma.202211814

Abstract

In recent years, the use of single atoms (SAs) has become of a rapidly increasing significance in photocatalytic H2 generation; here SA noble metals (mainly Pt SAs) can act as highly effective co-catalysts. The classic strategy to decorate oxide semiconductor surfaces with maximally dispersed SAs relies on “strong electrostatic adsorption” (SEA) of suitable noble metal complexes. In the case of TiO2 – the classic benchmark photocatalyst – SEA calls for adsorption of cationic Pt complexes such as [(NH3)4Pt]2+ which then are thermally reacted to surface-bound SAs. While SEA is widely used in literature, in the present work it is shown by a direct comparison that reactive attachment based on the reductive anchoring of SAs, e.g., from hexachloroplatinic(IV) acid (H2PtCl6) leads directly to SAs in a configuration with a significantly higher specific activity than SAs deposited with SEA – and this at a significantly lower Pt loading and without any thermal post-deposition treatments. Overall, the work demonstrates that the reactive deposition strategy is superior to the classic SEA concept as it provides a direct electronically well-connected SA-anchoring and thus leads to highly active single-atom sites in photocatalysis.

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APA:

Wang, Y., Qin, S., Denisov, N., Kim, H., Bad'ura, Z., Sarma, B.B., & Schmuki, P. (2023). Reactive Deposition Versus Strong Electrostatic Adsorption (SEA): A Key to Highly Active Single Atom Co-Catalysts in Photocatalytic H2 Generation. Advanced Materials. https://doi.org/10.1002/adma.202211814

MLA:

Wang, Yue, et al. "Reactive Deposition Versus Strong Electrostatic Adsorption (SEA): A Key to Highly Active Single Atom Co-Catalysts in Photocatalytic H2 Generation." Advanced Materials (2023).

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