Enhancement of NiOx/Poly-Si Contact Performance by Insertion of an Ultrathin Metallic Ni Interlayer

Lange S, Fett B, Kabakli ÖS, Adner D, Kroyer T, Bogati S, Schulze PS, Herbig B, Hagendorf C, Sextl G, Mandel K (2023)


Publication Type: Journal article

Publication year: 2023

Journal

DOI: 10.1002/pssa.202200882

Abstract

Nickel oxide ((Formula presented.)) is a promising hole transport material for perovskite/Si tandem solar cells. Various silicon cell architectures may be used as bottom cells. The polycrystalline (poly-Si) (Formula presented.) tunnel diode is expected to be a high-efficiency interconnection scheme between the two subcells of monolithic tandems in p-i-n configuration with a high thermal budget, excellent passivation properties, and low contact resistivity. However, (Formula presented.) is then interfaced to poly-Si((Formula presented.)) and the chemical integrity of the interface due to the necessity of annealing treatments has to be questioned. For this purpose, the (Formula presented.) /poly-Si contact resistivity for different annealing temperatures is investigated between 100 and 500 °C, and two different (Formula presented.) deposition techniques, namely, wet-chemically applied and sputter-deposited (Formula presented.). The values of more than (Formula presented.) are obtained. The insertion of a nm-thin metallic Ni interlayer is shown to enable a tremendous decrease of the contact resistivity by 2–3 orders of magnitude. The formation of (Formula presented.) is proven by highly resolved (scanning) transmission electron microscopy ((S)TEM) coupled with energy-dispersive X-ray spectroscopy (EDXS). This interfacial engineering approach is expected to provide an effective way of improving the contact properties and integrability of (Formula presented.) into various tandem cell processes.

Involved external institutions

How to cite

APA:

Lange, S., Fett, B., Kabakli, Ö.S., Adner, D., Kroyer, T., Bogati, S.,... Mandel, K. (2023). Enhancement of NiOx/Poly-Si Contact Performance by Insertion of an Ultrathin Metallic Ni Interlayer. physica status solidi (a). https://dx.doi.org/10.1002/pssa.202200882

MLA:

Lange, Stefan, et al. "Enhancement of NiOx/Poly-Si Contact Performance by Insertion of an Ultrathin Metallic Ni Interlayer." physica status solidi (a) (2023).

BibTeX: Download