Solid-State NMR Spectroscopic Investigation of TiO2 Grown on Silica Nanoparticles by Solution Atomic Layer Deposition

Ding F, Tavera Méndez CL, Grass JP, Crisp R, Barr M, Wisser D (2023)

Publication Type: Journal article

Publication year: 2023

Journal

DOI: 10.1002/admi.202202131

Abstract

Atomic layer deposition in solution (sALD) is just emerging as a technology for the preparation of thin films. Unlike ALD from the gas phase, it allows for mild reaction conditions in a solvent phase and at room temperature, thus decreasing the energy requirements of the process and widening the range of accessible precursor molecules. In this work, the deposition of thin films of titania on silica is investigated using titanium(IV) isopropoxide (TTIP) and water as precursors, which are alternatingly brought into contact with the support in a home-built plug flow reactor. The mechanism of covalent grafting of the precursor to the surface, subsequent hydrolysis, and reaction to a layer of titania are investigated in detail using magic angle spinning (MAS) solid-state nuclear magnetic resonance (NMR) spectroscopy. TTIP preferentially reacts with Q² groups of condensed silica. 2D solid-state NMR spectra allow to clearly show the successful grafting of this compound to the support by the appearance of a characteristic signal at −107 ppm, which is tentatively attributed to silicon nuclei in a Si-O-Ti bond, and to reveal the presence of titanol groups on the emerging TiO2 film.

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How to cite

APA:

Ding, F., Tavera Méndez, C.L., Grass, J.P., Crisp, R., Barr, M., & Wisser, D. (2023). Solid-State NMR Spectroscopic Investigation of TiO2 Grown on Silica Nanoparticles by Solution Atomic Layer Deposition. Advanced Materials Interfaces. https://dx.doi.org/10.1002/admi.202202131

MLA:

Ding, Fei, et al. "Solid-State NMR Spectroscopic Investigation of TiO2 Grown on Silica Nanoparticles by Solution Atomic Layer Deposition." Advanced Materials Interfaces (2023).

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