Thermal stability of B-based multilayer mirrors for next generation lithography

Naujok P, Murray K, Yulin S, Patzig C, Kaiser N, Tuennermann A (2017)

Publication Type: Journal article

Publication year: 2017

Journal

Thin Solid Films Elsevier

Book Volume: 642

Pages Range: 252-257

DOI: 10.1016/j.tsf.2017.09.033

Abstract

The evolution of microstructure and reflective properties in a La/B4C and LaN/B4C multilayer was studied at elevated temperatures up to 800 °C. It was shown, that the observed opposite period thickness changes in La/B4C and LaN/B4C multilayers during annealing are based on structural modifications and chemical reactions at the interfaces. For T > 400 °C the period thickness of the La/B4C multilayer decreased, while it increased drastically in the LaN/B4C multilayer, which is explained by the formation of LaB6 crystallites and amorphous BN compounds, respectively. These thermally induced processes also lead to reflectivity drops at the wavelength of ~ 6.7 nm for both investigated systems. Even after annealing at 800 °C for 10 h the LaN/B4C multilayer showed an EUV reflectance of 12.6%, with is significantly higher than the La/B4C multilayer (2.3%), pointing up their higher thermal resistance.

Involved external institutions

Friedrich-Schiller-Universität Jena DE Germany (DE) Fraunhofer-Institut für Angewandte Optik und Feinmechanik (IOF) / Fraunhofer Institute for Applied Optics and Precision Engineering DE Germany (DE) Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen IMWS DE Germany (DE)

How to cite

APA:

Naujok, P., Murray, K., Yulin, S., Patzig, C., Kaiser, N., & Tuennermann, A. (2017). Thermal stability of B-based multilayer mirrors for next generation lithography. Thin Solid Films, 642, 252-257. https://dx.doi.org/10.1016/j.tsf.2017.09.033

MLA:

Naujok, P., et al. "Thermal stability of B-based multilayer mirrors for next generation lithography." Thin Solid Films 642 (2017): 252-257.

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