Direct growth of monolayer MoS2on nanostructured silicon waveguides

Kuppadakkath A, Najafidehaghani E, Gan Z, Tuniz A, Gia Quyet Ngo , Knopf H, Loechner FJF, Abtahi F, Bucher T, Shradha S, Kaesebier T, Palomba S, Felde N, Paul P, Ullsperger T, Schroeder S, Szeghalmi A, Pertsch T, Staude I, Zeitner U, George A, Turchanin A, Eilenberger F (2022)

Publication Type: Journal article

Publication year: 2022


DOI: 10.1515/nanoph-2022-0235


We report for the first time the direct growth of molybdenum disulfide (MoS2) monolayers on nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of utilizing the Chemical Vapour Deposition (CVD) on nanostructured photonic devices in a scalable process. Direct growth of 2D material on nanostructures rectifies many drawbacks of the transfer-based approaches. We show that the van der Waals material grow conformally across the curves, edges, and the silicon-SiO2 interface of the waveguide structure. Here, the waveguide structure used as a growth substrate is complex not just in terms of its geometry but also due to the two materials (Si and SiO2) involved. A transfer-free method like this yields a novel approach for functionalizing nanostructured, integrated optical architectures with an optically active direct semiconductor.

Involved external institutions

How to cite


Kuppadakkath, A., Najafidehaghani, E., Gan, Z., Tuniz, A., Gia Quyet Ngo, ., Knopf, H.,... Eilenberger, F. (2022). Direct growth of monolayer MoS2on nanostructured silicon waveguides. Nanophotonics.


Kuppadakkath, Athira, et al. "Direct growth of monolayer MoS2on nanostructured silicon waveguides." Nanophotonics (2022).

BibTeX: Download