Analysis and application of micro shockwave adjustment using ultrashort laser pulses
Bechtold P, Roth S, Schmidt M (2009)
Publication Type: Conference contribution
Publication year: 2009
Publisher: Laser Institute of America
Book Volume: 102
Pages Range: 1124-1133
Conference Proceedings Title: ICALEO 2009 - 28th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings
Event location: USA
ISBN: 9780912035598
DOI: 10.2351/1.5061462
Abstract
Micro shockwave adjustment is a process mechanism which can be used for highly precise actuator adjustment with bending angle accuracies exceeding 0.1 μrad in different materials. The specific interaction between focussed ultrashort laser pulse and irradiated material allows inducing this process mechanism by ablation with high pulse energy. Within this paper, an analysis based on models of ultrashort laser pulse - material interaction is presented and compared to experimental results. Actuators based on capacitive distance sensing are used to discuss the long-term stability of this process mechanism. Furthermore virtually free-form mirrors fabricated by micro shockwave bending are presented as another possible application of this process mechanism besides micro adjustment.
Authors with CRIS profile
Peter Bechtold
Lehrstuhl für Photonische Technologien (LPT)
Michael Schmidt
Lehrstuhl für Photonische Technologien (LPT)
Additional Organisation(s)
Involved external institutions
Germany (DE)How to cite
APA:
Bechtold, P., Roth, S., & Schmidt, M. (2009). Analysis and application of micro shockwave adjustment using ultrashort laser pulses. In ICALEO 2009 - 28th International Congress on Applications of Lasers and Electro-Optics, Congress Proceedings (pp. 1124-1133). USA: Laser Institute of America.
MLA:
Bechtold, Peter, Stephan Roth, and Michael Schmidt. "Analysis and application of micro shockwave adjustment using ultrashort laser pulses." Proceedings of the 28th International Congress on Applications of Lasers and Electro-Optics, ICALEO 2009, USA Laser Institute of America, 2009. 1124-1133.
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