Electrochemical Deposition by Design of Metal Nanostructures

Monaico E, Monaico EI, Ursaki VV, Tiginyanu IM, Nielsch K (2019)

Publication Type: Journal article

Publication year: 2019

Journal

Surface Engineering and Applied Electrochemistry Springer Verlag (Germany)

Book Volume: 55

Pages Range: 367-372

Journal Issue: 4

DOI: 10.3103/S1068375519040070

Abstract

Abstract –: We report on the application of specially-designed masks for the purpose of electrochemical etching of InP single crystals which enables one to change in a controlled fashion the direction of propagation of pores, including those propagating in directions parallel to the top surface of substrates. The fabricated templates have been used to electrochemically deposit metallic nanostructures along predefined directions and to develop two-dimensional arrays of metallic nanotubes or nanowires embedded in semiconductor matrices.

Involved external institutions

Ghitu Institute of Electronic Engineering and Nanotechnologies MD Moldova, Republic of (MD) Technical University of Moldova MD Moldova, Republic of (MD) Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden e.V. (IFW) / Leibniz Institute for Solid State and Materials Research Dresden DE Germany (DE)

How to cite

APA:

Monaico, E., Monaico, E.I., Ursaki, V.V., Tiginyanu, I.M., & Nielsch, K. (2019). Electrochemical Deposition by Design of Metal Nanostructures. Surface Engineering and Applied Electrochemistry, 55(4), 367-372. https://doi.org/10.3103/S1068375519040070

MLA:

Monaico, Ed., et al. "Electrochemical Deposition by Design of Metal Nanostructures." Surface Engineering and Applied Electrochemistry 55.4 (2019): 367-372.

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